T. Yunogami: search on Z-Library

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1

Radiation damage in SiO2/Si induced by low-energy electrons via plasmon excitation

Yunogami, Takashi, Mizutani, Tatsumi

Journal:

Journal of Applied Physics

Year:

1993

Language:

english

File:

PDF, 837 KB

english, 1993

2

Preparation of Zr–Si thin films by a simultaneous deposition and reaction process using pulsed ion beams

H. Suematsu, T. Kishi, J. Inoue, M. Hirai, T. Suzuki, T. Yunogami, W. Jiang, K. Yatsui

Journal:

Materials Letters

Year:

2007

Language:

english

File:

PDF, 552 KB

english, 2007

3

[American Vacuum Soc 2002 7th International Symposium on Plasma- and Process-Induced Damage - Maui, HI, USA (5-7 June 2002)] 7th International Symposium on Plasma- and Process-Induced Damage - Development of the damage evaluation technology of a low-k film by surface photo voltage

Yunogami, T., Inukai, K., Matsumoto, I., Vu, B., Ikarashi, M., Kawamura, K.

Year:

2002

Language:

english

File:

PDF, 322 KB

english, 2002

4

Radiation Damage in SiO 2 /Si Induced by VUV Photons

Yunogami, Takashi, Mizutani, Tatsumi, Suzuki, Keizo, Nishimatsu, Shigeru

Journal:

Japanese Journal of Applied Physics

Year:

1989

File:

PDF, 710 KB

1989

5

Development of a simultaneous dual-ablation apparatus and preparation of compositionally gradient (Sr[sub 1−x]Eu[sub x])Al[sub 2]O[sub 4] thin films

Kusaka, Yu, Suzuki, Tsuneo, Kato, Ariyuki, Yunogami, Takashi, Nakayama, Tadachika, Suematsu, Hisayuki, Niihara, Koichi

Journal:

Review of Scientific Instruments

Year:

2009

Language:

english

File:

PDF, 467 KB

english, 2009

6

Lower plasma-induced damage in SiO2/Si at lower temperatures

Mizutani, Tatsumi, Yunogami, Takashi, Tsujimoto, Kazunori

Journal:

Applied Physics Letters

Year:

1990

Language:

english

File:

PDF, 469 KB

english, 1990

7

Development of neutral-beam-assisted etcher

Yunogami, Takashi

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1995

Language:

english

File:

PDF, 480 KB

english, 1995

8

[IEEE International Electron Devices Meeting 1999. Technical Digest - Washington, DC, USA (5-8 Dec. 1999)] International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) - 0.5-μm-pitch copper-dual-damascene metallization using organic SOG (k=2.9) for 0.18-μm CMOS applications

Fukuda, T., Ohshima, T., Aoki, H., Maruyama, H., Miyazaki, H., Konishi, N., Fukada, S., Yunogami, T., Hotta, S., Maekawa, A., Hinode, K., Nojiri, K., Tokunaga, T., Kobayashi, N.

Year:

1999

Language:

english

File:

PDF, 617 KB

english, 1999

9

Etching technique for ruthenium with a high etch rate and high selectivity using ozone gas

M. Nakahara, S. Tsunekawa, K. Watanabe, T. Arai, T. Yunogami, K. Kuroki

Year:

2001

Language:

english

File:

PDF, 688 KB

english, 2001

10

Neutral-Beam-Assisted Etching System for Low-Damage S i O 2 Etching of 8-Inch Wafers

Yokogawa, Ken'etsu, Yunogami, Takasi, Mizutani, Tatsumi

Journal:

Japanese Journal of Applied Physics

Year:

1996

Language:

english

File:

PDF, 220 KB

english, 1996

11

Mechanism of Radiation Damage in SiO 2 /Si Induced by vuv Photons

Yunogami, Takashi, Mizutani, Tatsumi, Tsujimoto, Kazunori, Suzuki, Keizo

Journal:

Japanese Journal of Applied Physics

Year:

1990

Language:

english

File:

PDF, 279 KB

english, 1990

12

Anisotropic etching of RuO[sub 2] and Ru with high aspect ratio for gigabit dynamic random access memory

T. Yunogami, K. Nojiri

Year:

2000

Language:

english

File:

PDF, 1.14 MB

english, 2000

13

Neutral-Beam-Assisted Etching of SiO 2 –A Charge-Free Etching Process–

Mizutani, Tatsumi, Yunogami, Takashi

Journal:

Japanese Journal of Applied Physics

Year:

1990

File:

PDF, 583 KB

1990

14

Sub-Quarter-Micron Pt Etching Technology Using Electron Beam Resist with Round-Head

T. Yunogami, T. Kumihashi

Year:

1998

File:

PDF, 1.44 MB

1998

15

(Ni,Cu)O Phase in Thin Films Prepared by Pulsed Laser Deposition

T. Kamekawa, H. Asami, T. Suzuki, T. Nakayama, H. Suematsu, T. Yunogami, K. Niihara

Year:

2008

Language:

english

File:

PDF, 373 KB

english, 2008

16

Extinction of Large Droplets in Ion-Beam Ablation Plasma Produced by Ion-Beam Evaporation

H. Shishido, H. Yanagi, H. Kawahara, T. Suzuki, T. Yunogami, H. Suematsu, W. Jiang, K. Yatsui

Year:

2005

Language:

english

File:

PDF, 147 KB

english, 2005

17

Preparation of SrAl 2 O 4 :Eu,Dy Phosphor Thin Films on Organic Substrates by Pulsed Ion-Beam Evaporation

Honda, Naoya, Suzuki, Tsuneo, Yunogami, Takashi, Suematsu, Hisayuki, Jiang, Weihua, Yatsui, Kiyoshi

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 166 KB

english, 2005

18

Radiation Damage of SiO2/Si By Energetic Neutral Beam and Vjuv Photons

Mizutani, Tatsumi, Nishimatsu, Shigeru, Yunogami, Takashi

Journal:

MRS Proceedings

Year:

1988

Language:

english

File:

PDF, 338 KB

english, 1988

19

Preparation of Compositionally Gradient Cr-Al-N-O Thin Films by Pulsed Laser Deposition

Suzuki, Tsuneo, Fujinoki, Kazuya, Asami, Hiroki, Hirai, Makoto, Yunogami, Takashi, Suematsu, Hisayuki, Yatsui, Kiyoshi

Journal:

Journal of the Japan Institute of Metals

Year:

2012

File:

PDF, 1.76 MB

2012